| 1. | Research of unbalanced magnetron sputtering system
非平衡磁控溅射系统的研究 |
| 2. | Magnetron sputtering target source and sputtering procedure
磁控溅射靶源设计及溅射工艺研究 |
| 3. | Anticoagulant property of tio2 thin films prepared by magnetron sputtering
2薄膜的抗凝血性能 |
| 4. | Magnetron sputtering target plating machine
磁控平面靶镀膜机系列 |
| 5. | Dielectric properties of alumina films prepared by rf magnetron sputtering
3薄膜及其介电性能研究 |
| 6. | Preparation and mechanical properties of magnetron sputtered b4c thin film
薄膜的微结构及力学性能 |
| 7. | Preparation and mechanical properties of magnetron sputtered crnx thin films
薄膜的制备与力学性能 |
| 8. | All samples were prepared by rf magnetron sputtering method
所有样品采用射频辅助磁控溅射方法制备。 |
| 9. | Films material prepared by magnetron sputtering
膜的性质 |
| 10. | Planar magnetron sputtering system
平面磁控管溅镀系统 |
